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US 2026/0231692 A1Published application
Self-aligned heater for pcram using a continuous dielectric
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorSheng-Chih Lai
Life of this patent
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Abstract
A method includes forming a bottom electrode, forming a dielectric layer, forming a Phase-Change Random Access Memory (PCRAM) region in contact with the dielectric layer, and forming a top electrode. The dielectric layer and the PCRAM region are between the bottom electrode and the top electrode. A filament is formed in the dielectric layer. The filament is in contact with the dielectric layer.
Claims20
A structure comprising:
- a first memory cell comprising:
- a first electrode;
- a first portion of a dielectric layer contacting the first electrode;
- and
- a first Phase-Change Random Access Memory (PCRAM) region interfacing the dielectric layer;
- and
- a second memory cell comprising:
- a second electrode;
- a second portion of the dielectric layer contacting the second electrode, wherein the dielectric layer further comprises a third portion comprising a first end joining the first portion, and a second end joining the second portion;
- and
- a second PCRAM region interfacing the dielectric layer.
8 more elements
A structure comprising:
- a plurality of memory cells aligned to a row, wherein the plurality of memory cells comprise a first memory cell and a second memory cell, and wherein the plurality of memory cells comprise:
- a bottom electrode;
- a dielectric layer over the bottom electrode;
- a conductive filament in the dielectric layer;
- and
- a Phase-Change Random Access Memory (PCRAM) region electrically connected to the conductive filament, wherein a first portion of the dielectric layer in the first memory cell and a second portion of the dielectric layer in the second memory cell are parts of a continuous portion of the dielectric layer, and wherein the continuous portion of the dielectric layer continuously extends laterally beyond a combined region that comprises the first memory cell and the second memory cell;
- and
- a top electrode, wherein the PCRAM region is between, and is vertically aligned to the bottom electrode and the top electrode.
5 more elements
A structure comprising:
- a plurality of bottom electrodes;
- a dielectric layer over and contacting all of the plurality of bottom electrodes;
- a plurality of chalcogenide semiconductor regions physically contacting the dielectric layer, wherein the dielectric layer comprises:
- first portions overlapped by the plurality of chalcogenide semiconductor regions;
- and
- second portions interconnecting the first portions and vertically misaligned from the plurality of chalcogenide semiconductor regions, wherein the first portions are thicker than the second portions;
- and
- a plurality of top electrodes overlying the plurality of chalcogenide semiconductor regions.
5 more elements
Dependencies are inferred from the claim text.