Substrate processing apparatus, substrate processing method, and recording medium
AssigneeTokyo Electron Limited
InventorAkinori TANAKA
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AssigneeTokyo Electron Limited
InventorAkinori TANAKA
Estimating the term…
A substrate processing apparatus, includes: a rotary holder configured to hold and rotate a substrate; an arm configured to hold nozzles; a driver configured to drive the arm so that the nozzles move between a standby position and a processing position; a capturer configured to capture an image of the nozzles; a supplier configured to supply processing liquids to the nozzles; and a controller. The controller is configured to perform: a first process of causing the capturer to capture images of the nozzles located at the processing position; a second process of detecting tip end portions of the nozzles; a third process of detecting whether a droplet is hanging from an injection port of the tip end portions; a fourth process of calculating a height of the droplet; and a fifth process of determining whether an abnormality exists based on the height.
A substrate processing apparatus, comprising:
A substrate processing method, comprising:
Dependencies are inferred from the claim text.