Substrate treatment device and substrate treatment method
AssigneeSCREEN Holdings Co., Ltd.
InventorsMichinori IWAO, Hiroaki KAMON, Shota IWAHATA
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AssigneeSCREEN Holdings Co., Ltd.
InventorsMichinori IWAO, Hiroaki KAMON, Shota IWAHATA
Estimating the term…
Uniform substrate treatment is performed using electrolytic sulfuric acid. A substrate treatment device includes: a substrate treatment unit that treats a substrate using a treatment liquid containing electrolytic sulfuric acid; a supply tank that stores the treatment liquid to be supplied to the substrate treatment unit; a generation unit that generates the treatment liquid by electrolysis and supplies the generated treatment liquid to the supply tank; a collection unit that collects a supplied liquid that is the treatment liquid supplied to the substrate treatment unit and supplies the supplied liquid to the generation unit; a circulation path that returns the treatment liquid supplied from the supply tank to the supply tank; a first branch path that branches from the circulation path and supplies the treatment liquid to the substrate treatment unit; and a temperature increasing unit that increases a temperature of the supplied liquid.
A substrate treatment device comprising:
A substrate treatment method of treating a substrate using a treatment liquid containing electrolytic sulfuric acid, the substrate treatment method comprising:
Dependencies are inferred from the claim text.