Stage apparatus, substrate processing apparatus, article manufacturing method, and control method of stage apparatus
AssigneeCanon Kabushiki Kaisha
InventorsTOSHIYUKI MYOJO, SHIGEO KOYA
Life of this patent
Estimating the term…
Abstract
A stage apparatus includes a substrate chuck, a supplier configured to supply a gas to a space between a substrate and the substrate chuck, a pin member configured to support the substrate by protruding from a hole formed in the substrate chuck, a driver configured to move at least one of the substrate chuck and the pin member, and a controller configured to control the driver and the supplier based on a control profile, wherein the controller starts first supply of gas by the supplier in a second period during which, after a first period, the driver stops in a state in which the substrate and the pin member are close, and terminates the first supply before the second period ends.
Claims19
A stage apparatus comprising:
- a substrate chuck configured to support a substrate;
- a supplier configured to supply a gas to a space between the substrate and the substrate chuck;
- a pin member configured to support the substrate by protruding from a hole formed in the substrate chuck;
- a driver configured to move at least one of the substrate chuck and the pin member;
- and
- a controller configured to control the driver and the supplier based on a control profile,
- wherein
- the control profile includes a first period during which, from a state in which the substrate is placed on the substrate chuck, the driver drives so as to make the pin member protrude from the hole and approach the substrate, a second period during which, after the first period, the driver stops in a state in which the substrate and the pin member are close, and a third period during which, after the second period, the driver drives so as to separate the substrate and the substrate chuck, and
- the controller starts first supply of gas by the supplier in the second period, and terminates the first supply by reducing a supply amount of gas from the supplier before the second period ends.
A control method of a stage apparatus including a substrate chuck configured to support a substrate, a supplier configured to supply a gas to a space between the substrate and the substrate chuck, a pin member configured to support the substrate by protruding from a hole formed in the substrate chuck, and a driver configured to move at least one of the substrate chuck and the pin member, the method comprising:
- controlling the driver and the supplier based on a control profile,
- wherein
- the control profile includes a first period during which, from a state in which the substrate is placed on the substrate chuck, the driver drives so as to make the pin member protrude from the hole and approach the substrate, a second period during which, after the first period, the driver stops in a state in which the substrate and the pin member are close, and a third period during which, after the second period, the driver drives so as to separate the substrate and the substrate chuck, and
- the controlling includes
- starting first supply of gas by the supplier in the second period, and
- terminating the first supply by reducing a supply amount of gas from the supplier before the second period ends.
Dependencies are inferred from the claim text.