Multiple wavelength ellipsometer system and method of use
AssigneeFilm Sense, LLC
InventorsBlaine D. Johs, Bruce A. Hadwiger
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AssigneeFilm Sense, LLC
InventorsBlaine D. Johs, Bruce A. Hadwiger
Estimating the term…
The present disclosure relates in general to a multiple wavelength ellipsometer system and method for use in thin film characterization. The multiple wavelength ellipsometer system may include a polarization state generator, a polarization state detector, and combinations thereof. The polarization state generator may have a plurality of solid state light sources, such as but not limited to, sequentially scanned multiple light emitting diodes or laser diodes. In some embodiments, the sequentially scanned multiple light emitting diodes or laser diodes may be mounted in one plane. The polarization state detector may comprise no moving parts. In other embodiments, the polarization state detector may comprise multiple detectors mounted in one plane. In further embodiments, the polarization state detector may utilize economical uncoated glass plates as beam splitters. The system and method of use is designed to compensate for potential measurement errors induced by misalignment of the input beam angle to the polarization state detector via correction factors derived from a Mueller matrix model of the optics. To provide improved accuracy in the analysis of data acquired by the system, methods herein actively compensate for the relatively large bandwidth of the light source.
A multiple wavelength ellipsometer system, comprising:
A multiple wavelength ellipsometer system, comprising:
Dependencies are inferred from the claim text.