Method and measuring system for determining the effective focal length of an optical system
AssigneeTRUMPF Lasersystems for Semiconductor Manufacturing GmbH
InventorsStefan Piehler, Tolga Ergin
Life of this patent
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AssigneeTRUMPF Lasersystems for Semiconductor Manufacturing GmbH
InventorsStefan Piehler, Tolga Ergin
Estimating the term…
A method for determining an effective focal length of an optical system includes arranging an optical measuring device in an image-side focal plane of the optical system, directing an input beam at a first angle α1 relative to an object-side optical axis, and determining a first lateral position (x1, y1) of a first point of incidence of a first output beam on the optical measuring device, directing the input beam at a second angle α2 different from the first angle α1 relative to an object-side optical axis, and determining a second lateral position (x2, y2) of a second point of incidence of a second output beam on the optical measuring device, and determining the effective focal length EFL of the optical system from a mutual distance ΔL=√{square root over ((x2−x1)2+(y2−y1)2)} between the first point of incidence and the second point of incidence, and from a formula ΔL=EFL*tan(α2−α1).
A method for determining an effective focal length of an optical system, the method comprising:
Dependencies are inferred from the claim text.