Polishing apparatus and polishing method
AssigneeEbara Corporation
InventorMasaki KINOSHITA
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AssigneeEbara Corporation
InventorMasaki KINOSHITA
Estimating the term…
A polishing apparatus capable of accurately determining a position of a measurement point of a film thickness of a workpiece is disclosed. The polishing apparatus includes: a polishing head configured to press a workpiece against a polishing pad on a polishing table to polish the workpiece; a film-thickness sensor configured to measure a film thickness at a measurement point on a surface of the workpiece; an infrared imaging device configured to generate a first image and a second image of a feature region on the surface of the workpiece at a predetermined time interval through a back surface of the workpiece; and a processing controller configured to determine coordinates of the measurement point on the surface of the workpiece based on the first image and the second image.
A polishing apparatus comprising:
A polishing method comprising:
Dependencies are inferred from the claim text.