Sample Processing Method and Charged Particle Beam Device

A sample processing method for processing a sample by irradiating the sample with a charged particle beam, the sample processing method comprising:

• acquiring beam information including information on a shape and a size of a charged particle beam under a beam condition used for processing the sample;
• irradiating the sample, which includes a processing area to be processed with the charged particle beam and a remaining area to be left unprocessed, with the charged particle beam under the beam condition to acquire an observation image of the sample;
• specifying a boundary between the processing area and the remaining area by a luminance profile crossing the remaining area based on luminance information of the acquired observation image;
• and
• setting an irradiation position of the charged particle beam such that a boundary portion of the charged particle beam calculated based on the beam information comes into contact with the specified boundary, and processing the sample at the set irradiation position under the beam condition.

A charged particle beam device that irradiates a sample with a charged particle beam to process the sample, the charged particle beam device comprising:

• a charged particle beam source configured to emit the charged particle beam;
• an optical system configured to irradiate the sample with the charged particle beam emitted from the charged particle beam source;
• and
• a control unit, wherein
• the control unit is configured to
• acquire beam information including information on a shape and a size of a charged particle beam under a beam condition used for processing the sample,
• control the charged particle beam to be irradiated under the beam condition onto the sample including a processing area to be processed with the charged particle beam and a remaining area to be left unprocessed, and acquire an observation image of the sample,
• specify a boundary between the processing area and the remaining area by a luminance profile crossing the remaining area based on luminance information of the acquired observation image, and
• set an irradiation position of the charged particle beam such that a boundary portion of the charged particle beam calculated based on the beam information comes into contact with the specified boundary, and perform control to process the sample at the set irradiation position under the beam condition.