Systems, apparatus, and methods for multi-wavelength monitoring for semiconductor manufacturing

A system for processing substrates and applicable for semiconductor manufacturing, the system comprising:

• a chamber body at least partially defining an internal volume;
• one or more heat sources configured to heat the internal volume;
• a substrate support disposed in the internal volume;
• and
• a sensor assembly operable to measure energy of a plurality of wavelengths in the internal volume, the sensor assembly comprising:
• a probe comprising a view lens oriented toward the substrate support,
• a camera in optical communication with the probe,
• a rotatable wheel coupled to a motor, and
• a plurality of filters supported by the rotatable wheel, the motor operable to move the rotatable wheel to move the plurality of filters relative to the camera to respectively align the plurality of filters with the camera.

A system for processing substrates and applicable for semiconductor manufacturing, the system comprising:

• a chamber body at least partially defining an internal volume;
• one or more heat sources configured to heat the internal volume;
• a substrate support disposed in the internal volume;
• a sensor assembly operable to measure energy of a plurality of wavelengths in the internal volume, the sensor assembly comprising:
• a camera,
• a rotatable wheel coupled to a motor, and
• a plurality of filters;
• and
• a controller comprising instructions that, when executed, cause a plurality of operations to be conducted, the plurality of operations comprising:
• heating a substrate supported at least partially by the substrate support;
• flowing one or more process gases over the substrate to form one or more layers on the substrate;
• and
• rotating the rotatable wheel to shift the respective filters into alignment with an optical path of the camera.