Ion implanter and method of ion beam control using ion beam imaging system

Abstract

An ion implanter. The ion implanter may include an ion source, to generate an ion beam. The ion source may include an ion source chamber, and an adjustable electrode set, external to the ion source chamber. The ion implanter may include a set of beamline components, disposed along a beamline of the ion implanter, and arranged to direct the ion beam to a substrate position. The ion implanter may further include an in-situ beam imaging system, having at least one detector that images the ion beam in at least one location, between the ion source and the substrate position.

Dependencies are inferred from the claim text.