Aminoalkoxydisilazane compounds, composition for depositing silicon-containing thin film containing the same and method of manufacturing silicon-containing thin film using the same

A method of manufacturing a silicon-containing thin film, the method comprising:

• depositing (i) a silicon-containing thin film using an aminoalkoxydisilazane compound represented by the following Chemical Formula 1 or (ii) a composition for depositing a silicon-containing thin film comprising the aminoalkoxydisilazane compound represented by the following Chemical Formula 1:
• wherein:
• R1, R11, and R12 are independently of one another C1-C7 alkyl, C3-C7 cycloalkyl, or C2-C7 alkenyl, or R11 and R12 may be linked to each other to form a ring;
• R2 and R3 are independently of each other C1-C7 alkyl, C3-C7 cycloalkyl, or C1-C7 alkoxy;
• R is C1-C7 alkyl or C3-C7 cycloalkyl;
• and
• R4 and R5 are independently of each other C1-C7 alkyl, C3-C7 cycloalkyl, C1-C7 alkoxy, or C3-C7 cycloalkyloxy.