Fluorinated metal-amidrazonide complexes and method of using the same for deposition of metal-containing thin films

A method for forming a metal-containing film on a substrate, the method comprising:

• exposing the substrate to a vapor of a metal-containing film-forming composition that contains a fluorinated metal-amidrazonide precursor;
• and
• depositing at least part of the fluorinated metal-amidrazonide precursors onto the substrate to form the metal-containing film on the substrate through a vapor deposition method,
• wherein the fluorinated metal-amidrazonide precursor having the general formula
• wherein
• M is a transition metal or a rare earth element;
• E is selected from O, S, Se or Te;
• D is a monodentate, bidentate, tridentate, or a polydentate donor with a neutral charge;
• CaFbHc is a fluorinated backbone, wherein a≥1, b≥1, c≥0;
• R1 and R2 each are independently selected from an H, a C1-C6 linear or branched alkyl group, a C3-C6 cyclic alkyl group, a C2-C6 linear or branched alkene group, a C3-C6 cyclic alkene or aromatic group, wherein any coordinating moieties contain heteroatoms N, O, S;
• R3 is selected from an H, a C1-C6 linear or branched alkyl group, a C3-C6 cyclic alkyl group, a C2-C6 linear or branched alkene group, a C3-C6 cyclic alkene group, wherein cyclopentadienyl derivatives and any coordinating moieties contain heteroatoms N, O, S;
• x is from 1 to 5;
• y is from 0 to 5;
• and
• z is from 0 to 5.