Substrate processing apparatus and substrate processing method

A substrate processing apparatus that continuously performs water-repellent processing, cleaning processing, and drying processing on a plurality of substrates, the substrate processing apparatus comprising:

• a sealable chamber;
• a processing tank that is provided in the chamber, stores a cleaning liquid, and has an open upper portion;
• a lifter that holds a plurality of substrates and moves up and down between an internal position in the processing tank and a position above the processing tank;
• draining means including a processing tank drain port, for draining the cleaning liquid stored in the processing tank;
• processing tank pressure-reducing means for evacuating the chamber by reducing a pressure in the processing tank by a processing reducing pump;
• water repellent supplying means including ejection port, for supplying a water repellent to the substrates at the position above the processing tank;
• and
• controller for controlling a series of processings for the plurality of substrates, wherein
• in a process of performing the water-repellent processing on the plurality of substrates, the controller causes the water repellent supplying means to supply the water repellent to the substrates at the position above the processing tank while evacuating the chamber by causing the draining means to drain a processing liquid in the processing tank, and subsequently causing the processing tank pressure-reducing means to reduce a pressure in the processing tank.