Method of using a tle system and tle system
AssigneeMax-Planck-Gesellschaft zur Forderung der Wissenschaften e.V.
InventorsWolfgang Braun, Thomas J. Smart
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Abstract
The invention relates to a method of using a thermal laser evaporation (TLE) system. The TLE system comprises a reaction chamber fillable with a reaction atmosphere. A substrate is arranged in the reaction chamber, and one or more sources are arranged in the reaction chamber. Each source comprises a source element having a source material, and a laser source for providing a heating laser beam impinging with a heating spot on a top surface of the source element, thereby evaporating or sublimating the source material from an active area on the top surface of the source element. This provides a flux of evaporated or sublimated source material for a deposition onto the substrate.
Claims31
1-28. (canceled)
Method of using a thermal laser evaporation system, the TLE system comprising a reaction chamber fillable with a reaction atmosphere, a substrate arranged in the reaction chamber, one or more sources arranged in the reaction chamber, each source comprising a source element consisting of a source material, and a laser source for providing a heating laser beam impinging with a heating spot on a top surface of the source element and thereby evaporating or sublimating the source material from an active area on the top surface of the source element for providing a flux of evaporated or sublimated source material for a deposition onto the substrate,
- wherein the method comprises a step of providing a selected directional intensity distribution of the flux of evaporated or sublimated source material by actively adjusting a three-dimensional shape of the active area.
Dependencies are inferred from the claim text.