Composition and polymer
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsYuki Kokita, Ryutaro Sugawara
Life of this patent
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Abstract
A composition exhibiting favorable base material selectivity, and which can form a polymer brush having favorable brush density and heat resistance, as well as a polymer. The composition is used in selective modification of a base material having a surface including two or more regions made of different materials. The composition contains a polymer and a solvent, in which the polymer has a constitutional unit derived from styrene and/or a constitutional unit derived from a styrene derivative, and the polymer has a group represented by Formula (1) below at a terminal of the main chain
Claims6
A composition for use in selective modification of a base material having a surface including two or more regions with different materials from each other, the composition comprising:
- a polymer (A);
- and a solvent(S),
- wherein the polymer (A) comprises a constitutional unit derived from styrene, and/or a constitutional unit derived from a styrene derivative,
- wherein the polymer (A) comprises a group represented by Formula (1) below at a terminal of a main chain:
- wherein R1 is an optionally substituted divalent hydrocarbon group having 1 or more and 10 or less carbon atoms, and R2 is a monovalent hydrocarbon group.
A polymer comprising a constitutional unit derived from styrene and/or a constitutional unit derived from a styrene derivative;
- and
- a group represented by Formula (1) below at a terminal of a main chain:
- wherein R1 is an optionally substituted divalent hydrocarbon group having 1 or more and 10 or less carbon atoms, and R2 is a monovalent hydrocarbon group.
Dependencies are inferred from the claim text.