Semiconductor processing system and method of operating the same

A semiconductor processing system, comprising:

• a process reaction chamber comprising
• an inner chamber;
• and
• an outer chamber at least partially enclosing the inner chamber;
• a process gas exhaust pipeline configured to expel a process gas that undergoes high-temperature and high-pressure reaction in the inner chamber;
• and
• a cooling gas source configured to supply a cooling gas to the process gas exhaust pipeline via a cryogenic gas delivery pipeline, thereby allowing the cooling gas to mix with the process gas expelled from the inner chamber.

A method of operating a semiconductor processing system, comprising:

• discharging a process gas from a process reaction chamber into a process gas exhaust pipeline;
• supplying a cooling gas into the process gas exhaust pipeline, wherein a temperature of the cooling gas is lower than a temperature of the process gas and wherein a pressure of the cooling gas is greater than a pressure of the process gas;
• and
• mixing the process gas with the cooling gas in the process gas exhaust pipeline.