Substrate processing apparatus and substrate processing method

An apparatus for processing a substrate, the apparatus comprising:

• a treating chamber for processing a substrate with a treatment liquid;
• and
• a treatment liquid supply unit for supplying the treatment liquid to the treating chamber,
• wherein the treatment liquid supply unit includes:
• a treatment liquid tank for storing the treatment liquid;
• a treatment liquid supply line for connecting the treatment liquid tank and the treating chamber;
• and
• an acoustic wave applying module which is installed in the treatment liquid supply line and applies an acoustic wave to the treatment liquid supply line to improve cleanliness of the treatment liquid;
• a removal line for removing particles collected by the acoustic wave applying module to the outside;
• and
• a controller,
• the acoustic wave applying module includes:
• a case surrounding the treatment liquid supply line;
• an acoustic wave generating part installed in the case;
• a phase adjusting unit configured to adjust a phase of the acoustic wave, and
• a medium provided inside the case,
• the acoustic wave generating part is provided to form a standing wave in the treatment liquid supply line and adjust a phase of the acoustic wave, and
• the controller controls the acoustic wave applying module to perform:
• a collection operation of collecting particles and bubbles in the treatment liquid by generating an acoustic wave in the acoustic wave generating part when supplying the treatment liquid;
• and
• a moving operation of moving the collected particles and bubbles to an inner wall of the treatment liquid supply line by adjusting a phase of the acoustic wave in the phase adjusting unit.