Semiconductor process monitoring device and semiconductor process monitoring method

A semiconductor process monitoring method comprising:

• spectrally dispersing measurement light from a chamber;
• detecting a spectral image of the measurement light spectrally dispersed by the spectrally dispersing measurement light;
• and
• determining a progress status of a semiconductor process in the chamber, based on data obtained from a detection result of the spectral image of the measurement light,
• wherein
• in the spectrally dispersing measurement light, the measurement light is wavelength-resolved in a first direction, and a spectral image is formed for each wavelength in a second direction intersecting with the first direction,
• in the detecting a spectral image of the measurement light, a photodetector including a first pixel region and a second pixel region divided along the second direction detects the spectral image, and
• in the determining a progress status of a semiconductor process in the chamber, it is determined whether or not an abnormality occurs in the semiconductor process based on first spectrum data obtained in a first exposure time in the first pixel region, and an end point of the semiconductor process is determined based on second spectrum data obtained in a second exposure time, which is longer than the first exposure time, in the second pixel region.