Method and system of determining field dependent aberrations
AssigneesCarl Zeiss SMT GmbH, ASML Netherlands B.V.
InventorsEdwin BOON, Sebastian FUCHS, Joachim FISCHBACH, Toralf GRUNER
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AssigneesCarl Zeiss SMT GmbH, ASML Netherlands B.V.
InventorsEdwin BOON, Sebastian FUCHS, Joachim FISCHBACH, Toralf GRUNER
Estimating the term…
A method of determining field-dependent aberrations in an image field of an optical imaging system: defining a target grid comprising a plurality of target field points in the image field, wherein a target field point is a field point for which a level of aberration is to be determined; defining a measuring grid comprising a first subset of the target field points comprising all field points for which a level of aberration is to be determined in a measuring operation; measuring aberrations at all field points of the measuring grid to generate measured aberration data; defining an auxiliary grid comprising a second subset of the target field points comprising selected target field points not included in the measuring grid for which a level of aberration is to be determined in an aberration data generating operation.
A method of determining field-dependent aberrations in an image field of an optical imaging system based on a measuring operation determining aberration data for a plurality of field points in the image field, the method comprising:
Dependencies are inferred from the claim text.