Liquid chemical supply system having magnetic particle removal and related methods

A method, comprising:

• flowing a liquid chemical through a first line of a transport line of a liquid chemical supply system, the liquid chemical having magnetic particles dispersed therein;
• forming cleaned liquid chemical, including adhering the magnetic particles to an inner wall of the first line by forming a magnetic field by a first magnetic device mounted to the first line;
• performing a semiconductor process on a wafer by the cleaned liquid chemical supplied through the first line;
• following forming the cleaned liquid chemical, removing the magnetic particles from the inner wall by cleaning the first line;
• during cleaning the first line, forming the cleaned liquid chemical by flowing the liquid chemical through a second line of the transport line, the second line having a second magnetic device mounted thereto;
• and
• performing the semiconductor process on the wafer by the cleaned liquid chemical supplied through the second line.

A system, comprising:

• a storage tank operable to store a liquid chemical;
• a plurality of apparatuses in fluid communication with the storage tank and a semiconductor processing tool;
• a transport line having an outlet in fluid communication with one of the plurality of apparatuses, the transport line including:
• a first transport line segment having a first opening defined therein;
• and
• a first filter assembly in fluid communication with the first transport line segment, the first filter assembly having a second opening defined therein;
• a first magnetic device mounted to the first transport line segment, the first magnetic device generating a first magnetic field in the first opening;
• and
• a second magnetic device mounted to the first filter assembly, the second magnetic device generating a second magnetic field in the second opening.