Antenna device and method of forming the same
AssigneeTron Future Tech Inc.
InventorsKUAN-NENG CHEN, HAN-WEN HU, DAO-MING WU
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AssigneeTron Future Tech Inc.
InventorsKUAN-NENG CHEN, HAN-WEN HU, DAO-MING WU
Estimating the term…
A method of forming an antenna device includes: receiving a substrate formed of glass; and forming a redistribution layer (RDL) over the substrate. The formation of the RDL includes: depositing a first metallization layer over a first surface of the substrate; depositing a first patterned dielectric layer over the first metallization layer, wherein the first patterned dielectric layer has a first thickness; depositing a second metallization layer over the first patterned dielectric layer; and forming a second patterned dielectric layer over the second metallization layer. The second dielectric layer comprises a photoimageable dielectric (PID) material. The second patterned dielectric layer has a second thickness at least twice the first thickness.
A method of forming an antenna device, the method comprising:
An antenna device, comprising:
Dependencies are inferred from the claim text.