Connection assembly, plasma process flow supply system, plasma process system, and method for operating a plasma process

A connection assembly for a plasma process flow supply system comprising:

• a first inner conductor configured to provide a first direct voltage by means of a first direct current (DC) power supply;
• a second inner conductor configured to provide a second direct voltage by means of a second DC power supply;
• and
• an outer conductor which surrounds the first and second inner conductors to shield the first and second inner conductor and displays the reference potential of the first and second inner conductors,
• wherein the connection assembly is configured to be connected to:
• a plasma process assembly, the first and second DC power supply and a high frequency (HF) power supply, or
• an impedance adaptation circuit and a plasma process assembly, and/or
• an impedance adaptation circuit, the first and second DC power supply, and an HF power supply, and
• wherein the connection assembly is configured to guide an HF power signal related to the outer conductor via the first and second inner conductors to supply the plasma process assembly with HF power by means of the HF power supply.