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US 2026/0148933 A1Published application
Substrate property control using dose-dependent response
AssigneeApplied Materials, Inc.
InventorsD. Jeffrey Lischer, Morgan Evans, Jeffrey A. Morse
Life of this patent
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Abstract
A method of managing a property of a substrate is provided. The method may include selecting an implant recipe according to a set of criteria for processing the substrate. The method may further include measuring a dose saturation curve for the implant recipe, determining an implant procedure based upon the implant recipe and the dose saturation curve; and implementing the implant procedure in the substrate using a processing system.
Claims19
A method of managing a property of a substrate, comprising:
- selecting an implant recipe according to a set of criteria for processing the substrate;
- measuring a dose saturation curve for the implant recipe;
- determining an implant procedure based upon the implant recipe and the dose saturation curve;
- and
- implementing the implant procedure in the substrate using a processing system.
2 more elements
A method of managing a property of a substrate, comprising:
- selecting a processing recipe involving a source of an energy-imparting species for processing the substrate;
- measuring a dose saturation curve for the processing recipe;
- determining an energy exposure process based upon the processing recipe and the dose saturation curve;
- and
- implementing the energy exposure process by directing processing species to the substrate from the source of energy-imparting species.
2 more elements
Dependencies are inferred from the claim text.