Control of a replication process of a master holographic optical element for variable intensity or polarisation
AssigneeCarl Zeiss Jena GmbH
InventorsMarkus GIEHL, Christian BLECHSCHMIDT
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Abstract
The invention relates to techniques for producing a holographic optical element, HOE, by replication of a master HOE. More particularly, the invention relates to techniques for flexibly adjusting the diffraction efficiency of the HOE. An adjustable settable optical element (54) can be used to change the intensity and/or polarisation of light during an illumination process.
Claims27
A control apparatus for an exposure apparatus for producing a holographic optical element, (HOE) by replicating a master HOE within the framework of an exposure process carried out by the exposure apparatus, wherein the exposure process uses light which is emitted from at least one light source of the exposure apparatus during the exposure process along a beam path to a surface of the carrier layer of the master HOE, wherein a carrier layer of the master HOE is arranged along a carrier layer of the HOE during the exposure process,
- wherein the control apparatus comprises at least one processor and a memory, wherein the at least one processor is configured to load program code from the memory and to execute the program code, wherein the at least one processor is configured to perform the following steps based on the program code:
- controlling a beam movement unit of the exposure apparatus such that it moves the beam path during the exposure process in relation to the surface of the carrier layer of the master HOE, and
- controlling at least one adjustable optical element of the exposure apparatus, with the former being arranged in the beam path, so that the at least one adjustable optical element during the exposure process changes at least one of an intensity and a polarization of the light over time.
A method for controlling an exposure apparatus for producing a holographic optical element (HOE) by replicating a master HOE within the framework of an exposure process carried out by the exposure apparatus, wherein the exposure process uses light which is emitted from at least one light source of the exposure apparatus during the exposure process along a beam path to a surface of the carrier layer of the master HOE, wherein a carrier layer of the master HOE is arranged along a carrier layer of the HOE during the exposure process,
- the method comprising the following steps:
- controlling a beam movement unit of the exposure apparatus such that it moves the beam path during the exposure process in relation to the surface of the carrier layer of the master HOE, and
- controlling at least one adjustable optical element of the exposure apparatus, with the former being arranged in the beam path, so that the at least adjustable optical element during the exposure process changes at least one of an intensity and a polarization of the light over time.
Dependencies are inferred from the claim text.