Polysilicon structure including protective layer

A manufacture comprising:

• a polysilicon structure over a portion of a substrate;
• a spacer on a sidewall of the polysilicon structure, wherein the spacer has a concave corner region between an upper portion and a lower portion, the spacer has an outer sidewall and an inner sidewall, and the inner sidewall is between the outer sidewall and the polysilicon structure;
• and
• a protective layer contacting the outer sidewall of the spacer, wherein a height of the protective layer in a first direction perpendicular to a top surface of the substrate is less than a height of the spacer in the first direction, and the protective layer directly contacts the substrate.

A manufacture comprising:

• a polysilicon structure over a substrate;
• a spacer on a sidewall of the polysilicon structure, wherein the spacer has a concave corner region between an upper portion and a lower portion, the spacer has an outer sidewall and an inner sidewall, and the inner sidewall is between the outer sidewall and the polysilicon structure;
• and
• a protective layer contacting the outer sidewall of the upper portion of the spacer, wherein the protective layer contacts less than an entirety of the outer sidewall of the upper portion of the spacer, and the protective layer directly contacts the substrate.