Semiconductor device with polymer liner and method for fabricating the same
AssigneeNanya Technology Corporation
InventorKUO-HUI SU
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AssigneeNanya Technology Corporation
InventorKUO-HUI SU
Estimating the term…
The present application discloses a semiconductor device and a method for fabricating the same. The semiconductor device includes a first substrate comprising a front side and a back side parallel to the front side; a bonding dielectric positioned on the front side of the first substrate; a redistribution layer positioned between the bonding dielectric and the front side of the first substrate; a first dielectric layer positioned between the front side of the first substrate and the redistribution layer; a capping layer positioned between the redistribution layer and the bonding layer; a first conductive pad positioned between the capping layer and the bonding layer; a second dielectric layer positioned between the capping layer and the bonding layer, wherein a surface of the second dielectric layer is coplanar with a surface of the first conductive pad; and a conductive feature positioned in the bonding dielectric and the first conductive pad.
A semiconductor device, comprising:
A method for fabricating a semiconductor device, comprising:
Dependencies are inferred from the claim text.