Display device and method of manufacturing the same

A method of manufacturing a display device, the method comprising:

• forming a transistor, which comprises a semiconductor layer, on a substrate;
• forming a first electrode on the transistor;
• forming a pixel defining layer which comprises an opening exposing at least a portion of the first electrode;
• forming a light emitting layer on the first electrode in the opening;
• and
• forming a second electrode on the light emitting layer and the pixel defining layer, wherein
• the forming of the first electrode comprises forming a first conductive layer under an oxygen (O2) concentration of about 3% or less, and
• the first conductive layer comprises silver (Ag), palladium (Pd) and copper (Cu).

An electronic device comprising:

• a display device that provides an image;
• and
• a processor that transmits an image data signal to the display device, wherein the display device comprising:
• a substrate;
• a first electrode disposed on the substrate;
• a pixel defining layer comprising an opening which exposes at least a portion of the first electrode;
• a light emitting layer disposed on the first electrode in the opening;
• and
• a second electrode disposed on the light emitting layer and the pixel defining layer,
• the first electrode comprises a first conductive layer comprising silver (Ag), palladium (Pd) and copper (Cu), and
• in the first conductive layer, content of the silver (Ag) is in a range of about 97 wt % to about 99 wt %, content of the palladium (Pd) is in a range of about 0.1 wt % to about 2.9 wt %, and content of the copper (Cu) is in a range of about 0.1 wt % to about 2.9 wt %.