Automated control of process chamber components

A computer program product comprising a non-transitory computer readable medium on which is provided computer executable instructions for causing a computational system to perform a method for deposition control in a process chamber, wherein the instructions comprise instructions for:

• (a) obtaining, at a present time, information indicating a status of one or more components of the process chamber during performance of a deposition process on one or more wafers, wherein the deposition process comprises a plurality of deposition cycles performed in the process chamber;
• (b) determining whether adjustments to one or more control components of the process chamber are to be made by providing an input based on the obtained information to a trained machine learning model configured to determine adjustments as an output, wherein the adjustments to the one or more control components cause a change in the deposition process;
• (c) responsive to determining that adjustments to the one or more control components are to be made, transmitting instructions to a controller of the process chamber that cause the adjustments to the one or more control components to be implemented;
• and
• (d) repeating (a)-(c) until the deposition process has been completed.