Trench mosfet with periodic p-island shielding
AssigneeRenesas Electronics Corporation
InventorsKijeong HAN, Meng Chia LEE, Dilip Madhav RISBUD
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AssigneeRenesas Electronics Corporation
InventorsKijeong HAN, Meng Chia LEE, Dilip Madhav RISBUD
Estimating the term…
A semiconductor structure includes a silicon carbide semiconductor substrate of a first conductivity type. The semiconductor structure further includes a drift layer of the first conductivity type located above the semiconductor substrate, a channel layer of a second conductivity type located above the drift layer, and a source region of the first conductivity type located above the channel layer. The second conductivity type is opposite to the first conductivity type. A plurality of trenches penetrates through the source region, the channel layer and a portion of the drift region. A gate electrode is located within each of the plurality of trenches via a gate insulating film and a plurality of shielding structures of the second conductivity type is located around the gate electrode. The plurality of shielding structures covers sidewalls and a bottom of the plurality of trenches. The plurality of shielding structures is arranged in an island-like manner.
A semiconductor structure comprising:
A semiconductor structure, comprising:
A semiconductor structure, comprising:
Dependencies are inferred from the claim text.