Non-volatile memory device having vertical channels and methods of fabrication thereof
AssigneeInfineon Technologies AG
InventorsYanli ZHANG, Shivananda SHETTY, James PAK, Shiraiwa HIDEHIKO, Liu ZHIZHENG
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AssigneeInfineon Technologies AG
InventorsYanli ZHANG, Shivananda SHETTY, James PAK, Shiraiwa HIDEHIKO, Liu ZHIZHENG
Estimating the term…
Semiconductor devices and methods of manufacturing the same are provided. The semiconductor devices may include a non-volatile memory (NVM) transistor form over a substrate having a buried lower source/drain (S/D) junction, an upper S/D junction, a vertical channel having a cylindrical shape disposed between the upper and lower S/D junctions, a cylindrical memory film stack surrounding the vertical channel, and a gate layer disposed around the memory film stack. The semiconductor devices may also include word lines surrounding the vertical channels, bit lines and source lines connecting multiple NVM transistors. Other embodiments are also described.
A semiconductor device, comprising:
A non-volatile memory (NVM) array, including:
A semiconductor device, comprising:
Dependencies are inferred from the claim text.