Apparatus for making a multi-layer capacitive device using a micro-electromechanical system (mems) device and related methods

Abstract

An apparatus for making a multi-layer capacitive device may include a deposition chamber and a conductive material source within the deposition chamber. The apparatus may also include a dielectric material source within the deposition chamber and a micro-electromechanical system (MEMS) deposition shadow mask within the deposition chamber. The apparatus may also include a controller outside the deposition chamber and configured to selectively operate the conductive material source and the dielectric material source and operate the MEMS deposition shadow mask adjacent a substrate within the deposition chamber to selectively deposit alternating conductive material and dielectric material layers onto the substrate to make the multi-layer capacitive device.

Dependencies are inferred from the claim text.