Stacked ferroelectric random access memory
AssigneeIntel Corporation
InventorsSou-Chi Chang, Christopher M. Neumann, Chia-Ching Lin, Yu-Ching Liao, Uygar E. Avci, Joseph D’Sliva, Cheng-Ying Huang
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AssigneeIntel Corporation
InventorsSou-Chi Chang, Christopher M. Neumann, Chia-Ching Lin, Yu-Ching Liao, Uygar E. Avci, Joseph D’Sliva, Cheng-Ying Huang
Estimating the term…
An integrated circuit die includes an array of memory cells between a first surface and a second surface opposite the first surface. A first memory cell proximate the first surface comprises a first capacitor over a first transistor. A second memory cell under the first memory cell comprises a second capacitor under a second transistor. The first transistor may be stacked on the second transistor. The capacitors may include ferroelectric or anti-ferroelectric materials. The first capacitor is coupled with a first plate line located between the first surface and the array of memory cells. A via couples the second capacitor with a second plate line between the first surface and the array of memory cells.
An integrated circuit (IC) die, comprising:
An integrated circuit (IC) die, comprising:
A system, comprising:
Dependencies are inferred from the claim text.