Radio Frequency Sensor and Method for Monitoring of Plasma Status

Abstract

The present disclosure relates to a radio frequency (RF) sensor and a method for monitoring plasma status. The RF sensor includes a collector configured to collect, as sensing data, an induced electromotive force induced during a plasma process; and a processor configured to record the induced electromotive force as a function of time, perform Fourier transformation on the recorded induced electromotive force function to derive an amplitude value of an n-th harmonic (where n is a natural number equal to or greater than 1), and apply the derived amplitude value and a setting value of plasma equipment identified at the time of sensing data generation to an artificial intelligence algorithm to derive prediction data capable of monitoring plasma status and plasma process status. The RF sensor may also be applied in other embodiments.

Dependencies are inferred from the claim text.