Contamination detection system and method
AssigneeApplied Materials, Inc.
InventorWolfgang Aderhold
Life of this patent
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Abstract
Described herein is a method for detecting contaminations in a process chamber is provided. The method includes flowing a gas into a process chamber, and igniting a flame in the process chamber at a contact region between the gas a surface in the process chamber. The method may also include measuring one or more properties of the flame using an optical sensor, and identifying a contamination on the surface based on the one or more properties of the flame.
Claims20
A method comprising:
- flowing a gas into a process chamber;
- igniting a flame in the process chamber at a contact region between the gas and a surface in the process chamber;
- measuring one or more properties of the flame using an optical sensor;
- and
- identifying a contamination on the surface based on the one or more properties of the flame.
A system comprising:
- a process chamber;
- a window attached to the process chamber;
- a gas nozzle configured to distributed at least one gas into the process chamber;
- an optical sensor on the outside of the process chamber, wherein the optical sensor is configured to measure one or more properties of a flame at a contact between the at least one gas and a surface within the process chamber through the window;
- and
- a computing device to identify a contamination of the surface based on the one or more properties of the flame.
A non-transistory computer readable medium having instructions thereon, which, when executed by a processing device, causes the processing device to receive one or more properties of a flame from an optical sensor from a processing chamber.
Dependencies are inferred from the claim text.