Structure determination

A computer-implemented method, comprising:

• determining a representative ground truth structure in a semiconductor sample, the semiconductor sample comprising a region of interest, the region of interest comprising a plurality of structures extending mainly in a thickness direction of the semiconductor sample;
• determining an adapted image of a milled sample which was obtained by milling the semiconductor sample in a region comprising the region of interest, the adapted image comprising image representations of the structures in the region of interest at different positions in the thickness direction;
• determining a transformation by which the image representations of the structures at the different positions in the thickness direction build the ground truth structure;
• and
• storing the transformation for a future application of the transformation to a further sample having the plurality of structures.