Substrate processing method

A method of processing a substrate, the method comprising:

• a process preparing operation of setting an irradiation pattern of a laser emitted to the substrate;
• and
• after the process preparing operation, a process processing operation of processing the substrate by irradiating the substrate with the laser,
• wherein the process preparing operation includes:
• a distortion amount acquiring operation of acquiring a distortion amount of the irradiation pattern by irradiating a preset irradiation region with an irradiation pattern which has been generated from a laser source and modulated by a light modulation unit;
• a distortion correcting operation of generating a correction pattern based on the distortion amount acquired in the distortion amount acquiring operation and inputting the correction pattern to the light modulation unit, and
• a correction checking operation of irradiating the irradiation region with the correction pattern to check whether the correction pattern is appropriate,
• the process processing operation includes:
• a processing liquid supplying operation of supplying a processing liquid to the substrate;
• and
• a heating operation of heating the substrate by irradiating, with the correction pattern, the substrate on which a liquid film of the processing liquid is formed, and
• the light modulation unit is a Digital Micromirror Device (DMD) unit.

A method of processing a substrate, the method comprising:

• a process preparing operation of setting a pattern of a laser emitted to a substrate;
• and
• after the process preparing operation, a process processing operation of processing the substrate by irradiating the substrate with the laser,
• wherein the process preparing operation includes:
• a distortion amount acquiring operation of acquiring a distortion amount of the irradiation pattern for each of a plurality of irradiation regions by irradiating each of the plurality of irradiation regions with an irradiation pattern which has been generated from a laser source and modulated by a light modulation unit;
• a distortion correcting operation of generating a correction pattern corresponding to each of the plurality of irradiation regions based on the distortion amount acquired in the distortion amount acquiring operation and inputting the correction pattern to the light modulation unit;
• and
• a correction checking operation of irradiating each of the plurality of irradiation regions with the correction pattern to check whether the correction pattern is appropriate,
• the process processing operation includes:
• a processing liquid supplying operation of supplying a processing liquid to the substrate;
• and
• a heating operation of heating the substrate on which a liquid film of the processing liquid is formed,
• the heating operation includes:
• a laser modulating operation of modulating the laser using the light modulation unit;
• and
• a laser irradiating operation of irradiating the substrate with the correction pattern formed through the modulation of the laser, and
• the light modulation unit is a Digital Micromirror Device (DMD) unit.