US 2026/0092864 A1 · INTERFEROMETER SYSTEM AND METHOD

Abstract

An interferometer system and method capable of simultaneous refractive index and thermal defocus determination is disclosed. The system incorporates a collimating light that is spatially filtered, and expanded, and passed through a wedged shear plate and focused on a sample of known thickness. The focused light is retroreflected through the focusing optic, and reflected off the shear plate. The retroreflected light is reflected off the wedged shear plate forming two wavefronts. Where the two wavefronts spatially overlap, an observation screen is used to view the interference fringes formed. The focus optic is translated on a linear stage and the interferogram is used to determine the retroreflective condition for both the front and back surfaces of the sample. The system/method may be advantageously applied to a wide variety of optical lens materials, including but not limited to the characterization of infrared (IR) lens materials.

Claims21

Dependent claims

A dual-use interferometer system comprising:

(a) coherent light source (CLS);
(b) light conditioning optics (LCO);
(c) wedged shear plate (WSP);
(d) interferogram observation system (IOS);
(e) removable optical assembly (ROA);
(f) element under test (EUT);
(g) thermal test chamber (TTC);
(h) digital computing device (DCD);
and
(i) Z-motion control servomechanism (ZMC);
wherein:
said CLS generates light that is collimated, spatially filtered, and expanded by said LCO to form an LCO output light (LOL);
said LOL is passed through said WSP then through said ROA to said EUT;
said LOL is retroreflected back from said EUT through said ROA and reflected off said WSP to said IOS;
said LOL light reflected off said WSP is detected within said IOS by an electro-optic sensor (EOS);
said EUT is contained within said TTC;
and
said DCD executes instructions retrieved from a tangible computer readable medium to implement a closed control loop (CCL) that operates to control the distance between said ROA and said EVER EUT via actuation of said ZMC based on image data transferred from said EOS to said DCD.

15 more elements

Material Refractive Index (MRI), said method comprising:

(1) generating light from a Coherent Light Source (CLS) that is collimated, spatially filtered, and expanded by Light Conditioning Optics (LCO) and passing said light through a Wedged Shear Plate (WSP) (1301);
(2) focusing said light passed through said WSP on a Sample Under Test (SUT) of known thickness, t, using a Removable Optic Assembly (ROA) (1302);
(3) retroreflecting said focused light off said SUT, back through said ROA, and onto said WSP (1303);
(4) reflecting said retroreflected light off said WSP forming two wavefronts sheared by a distance S (1304);
(5) where said two wavefronts spatially overlap, viewing on a Transmissive Observation Screen (TOS) interference fringes formed using an electro-optic sensor (EOS) (1305);
(6) actuating a linear Z-Motion Control (ZMC) to change the distance between said ROA and said SUT (1306);
(7) applying interferogram fringe analysis to determine distance, delta-z, between a Front Retroreflective Condition (FRC) and Back Retroreflective Condition (BRC) of said SUT (1307);
and
(8) determining said MRI (n) of said SUT by dividing said thickness t of said SUT by said delta-z distance between said FRC z-position and said BRC z-position, using the equation n=t/(delta-z).

6 more elements

A shear plate interferometer method for measuring Material Refractive Index (MRI), said method comprising:

(1) measuring thickness t of a sample under test (SUT), placing said SUT in a thermal test chamber (TTC), and setting and holding a temperature within said TTC at a user specified temperature (UST) (1401);
(2) using a wedge angle of a Wedged Shear Plate (WSP) to produce a Parallel Fringe Pattern (PFP) in an interferogram observation system (IOS), wherein said PFP comprises fringes that rotate when brought through the focus of a Retroreflective Focus Condition (RFC), wherein said PFP has a slope of zero when at focus of said RFC (1402);
(3) actuating a linear Z-Motion Control (ZMC) to change positions of a removable optic assembly (ROA) and/or said SUT to z-positions inside, at, and outside focus of front retroreflection condition (FRC) of said SUT and collecting multiple interferogram images using an electro-optic sensor (EOS) (1403);
(4) filtering and averaging said PFPs at each of said z-positions (1404);
(5) applying Fringe Fitting Analysis (FFA) and Fast Fourier Transform (FFT) analysis of said PFP fringes to determine a z-position of said ROA corresponding to said RFC of said SUT (1405);
(6) determining if said filtering and averaging is sufficient to produce a measurement below a predefined user specified uncertainty level (UUL), and if not, proceeding to step (3) (1406);
(7) moving the ROA and/or SUT using the ZMC to z-positions inside, at, and outside focus of said back retroreflection condition (BRC) of said SUT at a distance t/n from a front surface of said and SUT collecting multiple interferogram images using said EOS and proceeding to step (4) until said FFA and FFT analysis is complete (1407);
(8) calculating said MRI of said SUT by dividing said thickness t of said SUT by a delta-z distance between said FRC z-position and said BRC z-position using the equation n=t/(delta-z) (1408);
and
(9) determining if an additional UST is specified, and if so, setting and holding a temperature within said TTC at a new UST and proceeding to step (2) (1409).

7 more elements

A shear plate interferometer method for measuring a Thermo-Optic Coefficient (TOC) of an Optic Under Test (OUT), said method comprising:

(1) setting and holding a first user specified temperature (UST) within a thermal test chamber (TTC) containing said OUT, and waiting for thermal equilibrium of said OUT (1501);
(1) generating light from a Coherent Light Source (CLS) that is collimated, spatially filtered, and expanded by Light Conditioning Optics (LCO) and passing said light through a Wedged Shear Plate (WSP) (1502);
(2) with said OUT, focusing light transmitted through said WSP to a Retroreflective Mirror (RRM) held at a focal length f of said OUT by a housing of said OUT (1503);
(3) retroreflecting said focused light off said RRM back through said OUT, and onto said WSP (1504);
(4) reflecting said retroreflected light off said WSP to form two wavefronts sheared by a distance S (1505);
(5) where said two wavefronts spatially overlap, sensing said overlap interference fringes using an electro-optic sensor (EOS) and viewing said fringes formed using a Transmissive Observation Screen (TOS) (1506);
(6) collecting multiple interferograms using said EOS (1507);
(7) setting and holding a second UST within said TTC containing said OUT, waiting for thermal equilibrium of said OUT, and collecting multiple interferograms using said EOS (1508);
(8) applying interferogram fringe analysis to determine focal length change, delta-z, of said OUT caused by transitioning said OUT from said first UST to said second UST, delta-T (1509);
and
(9) determining said TOC (B) of said OUT by dividing said delta-z of said OUT by the product of said delta-T and said focal length f of said OUT and calculating a ß value of said TOC using the equation ß=(delta-z)/(f*delta-T) (1510).

8 more elements

A shear plate interferometer method for measuring a Thermo-Optic Coefficient (TOC) of an Optic Under Test (OUT), said method comprising:

(1) placing a retroreflective mirror (RRM) inside the optic housing of said OUT at the focal length f of said OUT, placing said OUT and RRM assembly within a Thermal Test Chamber (TTC), setting and holding said TTC at a first user specified temperature (UST), and waiting for thermal equilibrium of said OUT (1601);
(2) using a wedge angle of a Wedged Shear Plate (WSP) to produce a Parallel Fringe Pattern (PFP) in an interferogram observation system (IOS), wherein said PFP comprises fringes that rotate when brought through the focus of a Retroreflective Focus Condition (RFC), wherein said PFP has a slope of zero when at focus of said RFC (1602);
(3) collecting multiple interferogram images using an electro-optic sensor (EOS) (1603);
(4) filtering and averaging said PFPs at each of said z-positions (1604);
(5) applying Fringe Fitting Analysis (FFA) and Fast Fourier Transform (FFT) analysis of said PFP fringes to determine the z-position of said RRM with respect to said focal length of said OUT (1605);
(6) determining if said filtering and averaging is sufficient to produce a measurement below a predefined user specified uncertainty level (UUL), and if not, proceeding to step (3) (1606);
(7) setting and holding a second UST within said TTC containing said OUT, waiting for thermal equilibrium of said OUT, and proceeding to step (3) (1607);
(8) calculating said TOC (B) of said OUT by subtracting said second UST from said first UST to determine delta-T, subtracting said z-position of said first UST from said z-position of said second UST to determine delta-z, and dividing said delta-z by the product of said delta-T and said focal length f and calculating ß value of said TOC using the equation ß=(delta-z)/(f*delta-T) (1608).

5 more elements

Dependencies are inferred from the claim text.

Interferometer system and method

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Interferometer system and method

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Abstract

Claims21