Substrate processing apparatus
AssigneeJusung Engineering Co., Ltd.
InventorsDo Hyung KIM, Chul Joo HWANG
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Abstract
A substrate processing apparatus according to an example embodiment includes a chamber having a sidewall, a susceptor having an inclined side surface and mounting a substrate inside the chamber, an upper dome covering an upper surface of the chamber and formed of a dielectric material, a lower dome covering a lower surface of the chamber and formed of a dielectric material, and a liner disposed inside the chamber and disposed between the upper dome and the lower dome. The liner may include an inclined portion having an inclined inner side surface opposing the included side surface of the susceptor.
Claims14
A substrate processing apparatus comprising:
- a chamber having a sidewall;
- a susceptor having an inclined side surface and mounting a substrate inside the chamber;
- an upper dome covering an upper surface of the chamber and formed of a dielectric material;
- a lower dome covering a lower surface of the chamber and formed of a dielectric material;
- and
- a liner disposed inside the chamber and disposed between the upper dome and the lower dome,
- wherein
- the liner comprises an inclined portion having an inclined inner side surface opposing the inclined side surface of the susceptor.
Dependencies are inferred from the claim text.