Film formation apparatus and film formation method

A film formation apparatus comprising:

• a chamber configured such that an inside of the chamber is able to be evacuated to a vacuum;
• a lid body provided to face an interior of the chamber via an opening of an upper part of the chamber;
• a target provided on the lid body and formed to include a film formation material that is to be deposited on a workpiece as a processed object by sputtering;
• a film formation room in which a film is formed on the workpiece arranged on a workpiece holder through sputtering of the target with plasma, the film formation room being formed in the chamber by the lid body and the workpiece holder that includes a first through hole;
• a conveyance body configured to rotate intermittently and to position the workpiece holder at a position corresponding to the lid body, the workpiece holder being placed on the conveyance body;
• a cylindrical part configured to move the workpiece holder to a position in contact with the lid body from the conveyance body;
• an inward flange formed at a lower end of the cylindrical part and extending in an inward direction from the lower end;
• an outward flange configured to come adjacent to and overlap with the inward flange while the cylindrical part moves and to obstruct entry of evacuated gas into the chamber, the outward flange being provided inside the cylindrical part and extending in an outward direction in the cylindrical part;
• a lift mechanism configured to elevate and lower the cylindrical part such that the cylindrical part comes into contact with and separates from the workpiece holder;
• and
• an evacuator configured to perform vacuum evacuation, the evacuator being provided at an opening in a bottom part of the chamber to face the film formation room, wherein
• the lift mechanism
• elevates the cylindrical part to bring the workpiece holder into contact with a lower edge of the lid body,
• causes the outward flange to come adjacent to and overlap with the inward flange, and
• causes the inside of the cylindrical part to communicate with the evacuator to form a first evacuation line that performs vacuum evacuation of a processing space of the film formation room, via the first through hole from the film formation room.