Substrate processing apparatus

A substrate processing apparatus configured to perform a batch process in which a plurality of substrates are processed as a batch, and a single-wafer process in which one substrate is processed at a time, continuously, the substrate processing apparatus comprising:

• a carrier placing shelf on which a carrier is placed, with the carrier storing a plurality of substrates that are in a horizontal orientation at a predetermined interval along a vertical direction;
• a transfer block that is positioned adjacently to the carrier placing shelf;
• a processing block positioned adjacently to the transfer block;
• and
• a substrate placing unit where a substrate is placed, wherein the transfer block includes:
• a first orientation converting mechanism that converts the plurality of substrates in the horizontal orientation, the plurality of substrates having been taken out from the carrier, to a vertical orientation;
• and
• a substrate handling mechanism that transports the plurality of substrates in the horizontal orientation as a batch, to and from the carrier placed on the carrier placing shelf, the first orientation converting mechanism, and the substrate placing unit, wherein
• the processing block includes:
• a batch processing area extending in a direction separating from the transfer block;
• a batch substrate transporting area provided along the batch processing area, and having one end extending to the transfer block and another end extending in a direction separating from the transfer block;
• an orientation converting area provided between the transfer block and the batch processing area;
• a single-wafer transporting area positioned adjacently to the transfer block and to the orientation converting area;
• and
• a single-wafer processing area positioned adjacently to the single-wafer transporting area,
• the batch processing area includes a plurality of batch processing baths that process the plurality of substrates in the vertical orientation as a batch, and that are arranged in a direction in which the batch processing area extends,
• the orientation converting area is provided with a second orientation converting mechanism that converts the plurality of substrates having been subjected to the batch process, from the vertical orientation to the horizontal orientation,
• the batch substrate transporting area is provided with a batch substrate transporting mechanism that transfers the plurality of substrates in the vertical orientation to and from a substrate delivery position that is defined in the transfer block, the plurality of batch processing baths, and the second orientation converting mechanism,
• the single-wafer processing area has a plurality of single-wafer processing chambers each of which processes one substrate in the horizontal orientation at a time,
• the single-wafer transporting area has a horizontal substrate transporting mechanism that is capable of transporting one substrate in the horizontal orientation at a time, from and to the second orientation converting mechanism, the plurality of single-wafer processing chambers, and the substrate placing unit, and
• the horizontal substrate transporting mechanism includes a hand that is horizontally movable and that holds a substrate in the horizontal orientation, and a lifting stage that raises and lowers the hand and that is at a fixed position in a horizontal direction.