Wet chemical etching system with fountain dispenser
AssigneeClassOne Technology
InventorsCraig Meuchel, Cody Carter, John Ghekiere, Alan Murray, Josh C. Upole
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Abstract
This document describes wet chemical etching systems designed to apply etching chemistry to a substrate's surface. The system, in some examples, includes a rotor that grips and rotates the substrate, in conjunction with a weir that forms a crest of wet chemistry beneath it. As the substrate rotates, surface tension draws the wet chemistry onto its surface. The system may also include a controller that manages the substrate's movement through different positions.
Claims12
A wet chemical etching system comprising:
- a rotor configured to grip a substrate;
- and
- a weir beneath the rotor and defining a slot configured to present a crest of wet chemistry such that, during rotation of the substrate while there is contact between the substrate and crest, surface tension of the wet chemistry draws the wet chemistry onto a surface of the substrate.
A wet chemical etching system comprising:
- a controller programmed to move a substrate to a first position to establish contact with wet chemistry flowing from a dispenser beneath the substrate, to rotate the substrate such that surface tension of the wet chemistry draws the wet chemistry onto a surface of the substrate, and to move the substrate to a second position further away from the dispenser than the first position such that the wet chemistry continues to be drawn onto the surface.
A wet chemical etching system comprising:
- a rotor configured to grip and rotate a substrate;
- and
- weir means beneath the substrate for dispensing a crest of wet chemistry to the substrate.
Dependencies are inferred from the claim text.