Varactors manufactured using deep trench isolation
AssigneeMicrochip Technology Incorporated
InventorsMazhar Hoque, Amit Rai, Samir Fuke, Joseph Rascon, Randy Yach
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AssigneeMicrochip Technology Incorporated
InventorsMazhar Hoque, Amit Rai, Samir Fuke, Joseph Rascon, Randy Yach
Estimating the term…
An apparatus, system, and method for the manufacturing of a varactor using deep trench isolation (DTI) is disclosed. The apparatus may include a substrate doped to form a well. The apparatus may also include a first trench etched in the substrate. The apparatus may additionally include a second trench etched in the substrate parallel to the first trench. The apparatus may further include a dielectric in the first trench and the second trench and a conductor within the dielectric in the first trench and the second trench. The substrate may form a bottom electrode of a first varactor and a second varactor. The conductor in the first trench may form a top electrode of the first varactor. The conductor in the second trench may form a top electrode of the second varactor.
An apparatus, comprising:
A method, comprising:
A varactor made by a process comprising:
Dependencies are inferred from the claim text.