Inductors manufactured using deep trench isolation
AssigneeMicrochip Technology Incorporated
InventorsMazhar Hoque, Amit Rai, Samir Fuke, Joseph Rascon, Randy Yach
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Abstract
An apparatus, system, and method for the manufacturing of an inductor using deep trench isolation (DTI) is disclosed. The apparatus may include a doped substrate forming a well. The apparatus may also include a trench etched in the substrate. The trench may have a shape of a coil. The apparatus may additionally include a dielectric in the trench. The apparatus may further include a conductor within the dielectric in the trench. The dielectric and the conductor may create a first inductor.
Claims20
An apparatus, comprising:
- a substrate doped to form a well;
- a trench etched in the substrate, the trench having a shape of a coil;
- a dielectric in the trench;
- and
- a conductor within the dielectric in the trench;
- wherein the dielectric and the conductor create a first inductor.
A method, comprising:
- etching a trench in a substrate, the trench having a coil shape and the substrate doped to form a well;
- filling the trench with a dielectric;
- and
- placing a conductor within the dielectric;
- wherein the dielectric and the conductor create a first inductor.
An inductor made by a process comprising:
- etching a trench in a substrate, the trench having a coil shape and the substrate doped to form a well;
- filling the trench with a dielectric;
- and
- placing a conductor within the dielectric;
- wherein the dielectric and the conductor create a first inductor.
Dependencies are inferred from the claim text.