Capacitor and method of manufacturing capacitor
AssigneesKabushiki Kaisha Toshiba, Toshiba Electronic Devices & Storage Corporation
InventorsHiroki KAWAKAMI, Susumu OBATA, Kazuhito HIGUCHI, Takayuki TAJIMA
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AssigneesKabushiki Kaisha Toshiba, Toshiba Electronic Devices & Storage Corporation
InventorsHiroki KAWAKAMI, Susumu OBATA, Kazuhito HIGUCHI, Takayuki TAJIMA
Estimating the term…
In general, according to one embodiment, a method of manufacturing a capacitor includes subjecting a conductive layer to dry etching to form a pattern including a connection portion extending from the conductive layer to one or more openings, and cutting a processing target substrate along a cutting position which includes a position where the connection portion is cut in a direction crossing an extending direction of the connection portion, so as to have the connection portion and a conductive material portion electrically disconnected from each other and to manufacture at least one capacitor element portion.
A method of manufacturing a capacitor, the capacitor comprising at least one capacitor element portion, the at least one capacitor element portion comprising a semiconductor substrate having a main surface with one or more recesses, a conductive layer provided for the main surface and the one or more recesses of the semiconductor substrate, a dielectric layer between the conductive layer and the semiconductor substrate, a first electrode electrically connected to the conductive layer, and a second electrode electrically connected to the semiconductor substrate, the method comprising:
A capacitor comprising:
Dependencies are inferred from the claim text.