Tunneling-based selectors incorporating van der waals (vdw) materials
AssigneeTetraMem Inc.
InventorsMinxian Zhang, Ning Ge
Life of this patent
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AssigneeTetraMem Inc.
InventorsMinxian Zhang, Ning Ge
Estimating the term…
In accordance with some embodiments of the present disclosure a tunneling-based selector is provided. The selector includes a multilayer barrier structure fabricated between a first electrode and a second electrode. The multilayer barrier structure includes a first layer of a first van der Waals (vdW) material; a second layer of a second vdW material; and a third layer of a third vdW material. The first layer of the first vdW material is fabricated between the second layer of the second vdW material and the third layer of the third vdW material. The electron affinity of the first layer of the first vdW material is lower than the second electron affinity of the second layer of the second vdW material and the electron affinity of the third layer of the vdW material.
A method, comprising:
Dependencies are inferred from the claim text.