Three-dimensional flash memory using ferroelectric layer on basis of back gate structure
AssigneeSamsung Electronics Co., Ltd.
InventorYun Heub SONG
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AssigneeSamsung Electronics Co., Ltd.
InventorYun Heub SONG
Estimating the term…
Disclosed is a three-dimensional flash memory using a ferroelectric layer on the basis of a back gate structure. According to an embodiment, a three-dimensional flash memory comprises: a plurality of word liens extending on a substrate in a horizontal direction and sequentially stacked; and a plurality of strings extending through the plurality of word lines on the substrate in one direction, each of the plurality of strings including a channel layer extending in the one direction and a ferroelectric layer extending in the one direction to surround the channel layer, wherein a back gate extending in the one direction and an insulating layer extending in the one direction to surround the back gate are disposed inside the channel layer, and the channel layer and the ferroelectric layer constitute a plurality of memory cells corresponding to the plurality of word lines, wherein the ferroelectric layer is formed of a ferroelectric material and used as data storage by changing and maintaining the states of electric charges.
A three-dimensional flash memory comprising:
A three-dimensional flash memory comprising:
A three-dimensional flash memory comprising:
Dependencies are inferred from the claim text.