Bifunctional molecular group structure for photoresist, and synthesis method, and use method for the same
AssigneeShanghai Huali Integrated Circuit Corporation
InventorsLingyan QIN, Rui QIAN
Life of this patent
Estimating the term…
Loading patent…
AssigneeShanghai Huali Integrated Circuit Corporation
InventorsLingyan QIN, Rui QIAN
Estimating the term…
The present application discloses a bifunctional molecular group structure for a photoresist, including: a linker, a PAG molecule, and a PDQ molecule. The linker contains a carbon-oxygen chemical bond or a carbon-nitrogen chemical bond. Each linker is bonded to both the PAG molecule and the PDQ molecule in a number ratio, and the total number of the PAG molecule and the PDQ molecule is 3 or more. The PAG molecule is bonded to the linker through the carbon-oxygen chemical bond. The PDQ molecule is bonded to the linker through the carbon-nitrogen chemical bond. The present application also discloses a method for synthesizing the bifunctional molecular group structure for a photoresist. The present application further discloses a method for using a photoresist employing the bifunctional molecular group structure. In the present application, the ratio of the PAG molecule to the PDQ molecules can be set.
A bifunctional molecular group structure for a photoresist, wherein the bifunctional molecular group structure comprises:
Dependencies are inferred from the claim text.