Method for forming optical waveguide structure
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsCHIH-TSUNG SHIH, HAU-YAN LU, WEI-KANG LIU, YINGKIT FELIX TSUI
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Abstract
A semiconductor photonic device includes a semiconductor waveguide, a cladding structure surrounding the semiconductor waveguide, and an optical isolation structure disposed in the cladding structure. A top surface of the optical isolation structure is lower than a top surface of the semiconductor waveguide, and a bottom surface of the optical isolation structure is higher than a bottom surface of the semiconductor waveguide.
Claims20
A semiconductor photonic device, comprising:
- a semiconductor waveguide;
- a cladding structure surrounding the semiconductor waveguide;
- and
- an optical isolation structure disposed in the cladding structure,
- wherein a top surface of the optical isolation structure is lower than a top surface of the semiconductor waveguide, and a bottom surface of the optical isolation structure is higher than a bottom surface of the semiconductor waveguide.
A semiconductor photonic device, comprising:
- a semiconductor waveguide extending in a first direction;
- a cladding structure surrounding the semiconductor wave guide;
- and
- an optical isolation structure disposed in the cladding structure and extending in a second direction different from the first dire,
- wherein a length of the semiconductor waveguide is less than a length of the optical isolation structure in the second direction.
A semiconductor photonic device, comprising:
- a semiconductor waveguide;
- an optical isolation structure adjacent to the semiconductor waveguide;
- a first dielectric layer disposed under the semiconductor waveguide and the optical isolation structure;
- a second dielectric layer surrounding the semiconductor waveguide and the optical isolation structure;
- and
- a third dielectric layer covering the semiconductor waveguide and the optical isolation structure.
Dependencies are inferred from the claim text.