Ion sensing with deep trench isolation varactors
AssigneeMicrochip Technology Incorporated
InventorsMazhar Hoque, Amit Rai, Samir Fuke, Joseph Rascon, Arthur B. Eck, Randy Yach
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AssigneeMicrochip Technology Incorporated
InventorsMazhar Hoque, Amit Rai, Samir Fuke, Joseph Rascon, Arthur B. Eck, Randy Yach
Estimating the term…
Aspects provide a device comprising: a substrate doped to form a first well; a first deep trench etched in the substrate; a dielectric in the first deep trench; a first conductor within the dielectric in the first deep trench and biased to create a first depletion region in the substrate proximate the first deep trench, wherein the substrate forms a bottom electrode of a first deep trench isolation varactor and the conductor in the first deep trench forms a top electrode of the first deep trench isolation varactor; a sense electrode operable to become electrically charged when interacting with an ionized fluid, wherein the sense electrode is operable to electrically charge the first deep trench isolation varactor; and a fluid property measurement circuit operable to determine a change in the capacitance of the first deep trench isolation varactor and output a fluid property signal.
A device comprising:
A method, comprising:
A fluid property sensor made by a process comprising:
Dependencies are inferred from the claim text.