Loading patent…
AssigneeApplied Materials, Inc.
InventorsZhepeng CONG, Himani ARORA, Chen-Ying WU
Estimating the term…
The present disclosure relates to flow guide arrangements for gas activation and gas distribution, and related chamber kits, methods, and processing chambers. In one or more embodiments, a processing chamber includes a chamber body at least partially defining an internal volume, one or more heat sources operable to heat the internal volume, a substrate support disposed in the internal volume, and one or more inlet openings configured to direct a gas across a gas flow path over the substrate support and to one or more exhaust outlets. The processing chamber includes a flow guide disposed in the internal volume. The flow guide includes a first guide block, a second guide block disposed opposite the first guide block with respect to the gas flow path, and a flange connecting the first guide block and the second guide block.
A processing chamber, comprising:
A flow guide for disposition in a processing chamber, comprising:
A method of processing substrates, comprising:
Dependencies are inferred from the claim text.